Eclado Laboratory by Allura Cosmetic

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A.C Centella Mask



The mask helps to remove impurities from the pores while controlling sebum and providing moisture to the skin. Dimethyl Sulfone, Centella Asiatica Extract, Houttuynia Extract and Tea Tree Leaf Oil help to regulate excessive sebum and relief acne troubled skin.

Directions for use:

Apply a thick layer of mask over your face, avoiding the eye and lip area. Rinse off thoroughly after 20 minutes.

Main Ingredients:

Water, Clay, Dipropylene Glycol, Dimethyl Suffone, Glycerin, Bentonite, Cetearyl Alcohol, 1,2-Hexanediol, Titanium Dioxide, Cetyl Ethylhexanoate, Centella Asiatica Extract, Houttuynia Cordata Extract, Lactobacillus/Soybean Ferment Extract, Salix Alba(Willow) Bark Extract, Cinnamomum Cassia Bark Extract, Origanum Vulgare Leaf Extract, Chamaecyparis Obtusa Leaf Extract, Scutellaria Baicalensis Root Extract, Portulaca Oleracea Extract, Laminaria Digitata Extract, Undaria Pinnatifida Extract, Butylene Glycol, Sodium Hyaluronate, Macadamia Temifolia Seed Oil, Cetearyl Olivate, Sorbitan Olivate, Panthenol, Allantoin, Polyacrylamide, C13-14 Isoparaffin, Laureth-7, Disodium EDTA, Chlorphenesin, Melaleuca Altemifolia(Tea Tree) Leaf Oil.

SKU E180E Category